Pumping by chemical means
DOI: 10.1063/1.3070958
The need for a vacuum environment has been encountered by more and more fields over the years. In high‐energy accelerators, extraneous molecules would attenuate the beam of particles being accelerated. In mass spectrometers, atmospheric gases would mask the sample being analyzed. In thin‐film production, impurities would affect the electrical properties of the film being deposited. Similar considerations arise in the fields of space simulation, surface physics, thermonuclear research, pollution detection and control, analytical instrumentation and many others.
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More about the authors
Theodore Tom, Veeco Instruments Inc., Sunnyvale, California.
