Laser annealing of silicon

JUN 01, 1982

Scanned and pulsed laser beams rapidly heat silicon surfaces, revealing basic mechanisms of crystallization and amorphization, while paving the way for the fabrication of novel semiconductor devices.

DOI: 10.1063/1.2915125

John M. Poate

Walter L. Brown

Silicon is one of the best understood of all materials because it lies at the heart of one of the central technologies of the twentieth century: integrated circuits. How much more can we learn about silicon and ways of handling it? Quite a lot, apparently, if the remarkable developments in laser annealing over the past five years are any indication.

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More about the Authors

John M. Poate. Bell Laboratories, Murray Hill, New Jersey.

Walter L. Brown. Bell Laboratories, Murray Hill, New Jersey.