AVS annual symposium, Industrial Physics Forum have broad appeal
DOI: 10.1063/1.2364247
From advanced surface engineering to applied surface science, from nanomanufacturing to biomaterials, from vacuum technology to ultrabright light sources, AVS’s 53rd annual International Symposium and Exhibition offers a huge variety of presentations, lectures, workshops, and topical conferences.
For the first time, AVS: Science and Technology of Materials, Interfaces, and Processing is holding its annual meeting—held from Sunday, 12 November through Friday, 17 November, at the Moscone West convention center in San Francisco—in conjunction with the annual American Institute of Physics’ Industrial Physics Forum.
The IPF convenes industry executives, research managers, academics, and science-policy decision makers. According to AIP, the forum fosters the sharing of business knowledge and research collaboration and allows leaders in physics to keep current on research and policy developments that affect the physical sciences community. IPF sessions also provide attendees with opportunities to exchange ideas with physics leaders who face similar research and business challenges. Bringing the two events together was a sound choice, organizers said.
“IPF brings in a set of very distinguished invited speakers,” said Terry Michalske, director of biological and energy sciences at Sandia National Laboratories and this year’s symposium program chair. “We felt our attendees would certainly benefit, and [AIP and AVS] were able to come to an agreement on a topical area that we both had a lot of energy around—nanomanufacturing. It’s very synergistic for us to pool our efforts here.”
Nanotechnology
Among this year’s four IPF sessions, all at the convention center, is “Examples of Nanotechnology Manufacturing” at 8:00am on Monday, 13 November. Talks will look at new technologies that have been or will be enabled through the use of nanostructures. “Beyond CMOS: Emerging Materials and Devices,” another IPF session at 2:00pm Monday, will examine needs and options that might extend the recent decades of rapid improvements in information technology devices. “Nanotechnology and Society,” at 8:00am Tuesday, 14 November, will explore environmental, safety, health, and economic issues from industrial and regulatory perspectives. IPF’s fourth session, “Frontiers in Physics,” will be at 2:00pm Tuesday and is not part of the nanotechnology topical conference. The session addresses the most exciting applied-physics research going on today. Other sessions will focus on the manufacture of quality nanosized building blocks, their assembly into devices and systems, the processing of patterned surfaces, and the measurement control standards needed for manufacturing. A reception for IPF and AVS symposium registrants will be at 7:30pm Sunday, 12 November, at the Renaissance Parc 55 Hotel.
Sunday afternoon will feature two all-invited symposium plenary sessions, both at 3:00pm at the convention center. One will consider science and technology challenges that are critical for a clean and abundant supply of energy, and the other is on biomaterial interfaces, a topic especially relevant for disease diagnostics and treatment.
Following the plenary sessions Sunday is a 6:00pm talk by lecturer and journalist Paul Roberts on “The End of Oil: Dependence, Depletion, and Denial.” Roberts will discuss his belief that despite recent support for “renewables” and a corresponding rise in energy rhetoric, US energy policy, industrial strategy, and political culture remain committed to hydrocarbons—even as the unsustainability of a petroleum-based economy becomes clearer.
AVS’s plenary lecture will be given by Stefan Hell, director at the Max Planck Institute for Biophysical Chemistry in Göttingen, Germany, on “Far-field Fluorescence Microscopy at the Macromolecular Scale.” The lecture is at noon Monday in the convention center.
A talk on the operation of scientific instrumentation in near-Earth space from 1958 to the present will be at 2:00pm Wednesday, 15 November at the convention center and will trace the development of instruments over the years and the impact of their observations. The talk aims to provide context for a special history session to follow on “Franklin and the Future.” That session is at 8:00am Thursday, 16 November at the convention center and is co-hosted by AVS’s vacuum technology division and history committee and the Center for History of Physics at AIP. To begin the session, Joyce Chaplin, a distinguished historian of science at Harvard University, will speak on “Benjamin Franklin’s Science—in Public and Private.” The session will also include future-oriented presentations on monolayer films, the outlook for electrophotography, the physics and technology that emerged from Franklin’s kite experiment, and prospects in the generation of high voltages.
Special offerings
Other events include a mixer for symposium attendees and exhibitors from 5:00 to 6:30pm Monday at the convention center; a poster session will follow. Exhibits are Tuesday through Thursday in the exhibit hall during symposium hours. Exhibitor workshops, a series of brief technical presentations, are Tuesday through Thursday in the exhibit hall stage area during coffee and lunch breaks. Topics include surface science tools and processes, vacuum technology, and nanotechnology-related surface-science tools. An exhibit reception will be from 5:00 to 6:00pm Tuesday in the exhibit hall.
Eight AVS short courses throughout the week will address vacuum and equipment technology, materials and interface characterization, and materials processing.
Poster sessions are 6:00pm Tuesday and 5:30pm Thursday in the convention center’s third-floor lobby. Topics include surface science, etching and process integration, vacuum technology, magnetic interfaces and nanostructures, high-pressure discharges, thin film, and advanced surface engineering. For more information consult the society’s website at http://www.avs.org .
Sessions with invited speakers
Sunday, 12 November
Afternoon
Energy Science and Technology. Hansen, Arvizu, Westwell, Goldston, Murray
Miniaturization Challenges in Biotechnology. Colvin, Natan, Craighead
Monday, 13 November
Morning
Catalytic Chemistry of Hydrocarbons. Wachs, Bartels
Gas–Surface Reaction Dynamics. Harrison, Schoenlein
Organic Surface Modification and Nanoscale Chemical Patterning. Ivanisevic, Textor, Nealey
Etching for Advanced Interconnect I. Oehrlein
Advanced Gate Fabrication. Joubert
Nucleic Acids at Surfaces I. Knoll
Nanoscale Imaging Techniques. Novotny
IPF: Examples of Nanotechnology Manufacturing. Wolfe, Siegel, Verbrugge, Alivisatos, Baker
ALD and Applications I. Sung
Afternoon
Catalysis for the Hydrogen Economy. Norskov, Gorte
Contacts, Interfaces, and Defects in Semiconductors. Brillson
Functionalization of Semiconductor Surfaces. Yoshinobu
Developing Methods for Data Analysis. Ohlhausen
Surface and Interface Science of MEMS and NEMS. Blushan
Manufacturing and Scientific Challenges for Plasma Processing at 32 nm. Watanabe, Kang, Verove
Nucleic Acids at Surfaces II. Goldberg
IPF: Beyond CMOS: Emerging Materials and Devices. Gargini, Coufal, Mayberry, Vogel, Bonnell
ALD and Applications II. Elam
Tuesday, 14 November
Morning
Vacuum Generation and Measurement. Looney
Microbe–Surface Interactions. Busscher
IPF: Nanotechnology and Society. Alderson, Maynard, Ostraat, Zhang, Johnson
Reactivity of Metal Clusters. Schneider
Zinc Oxide. Coutts
Water–Surface Interactions. Hemminger
Environmental Materials and X-Ray Spectroscopies. Vicenzi, Woodruff
Magnetic Nanostructures, Nanoparticles, and Interfaces. Weller, Farle, Liu, Jin
Material Aspects of MEMS and NEMS. Hone, Ghodssi
Plasma Patterning. Hayashi
Plasma Surface Interactions. Donnelly
Biodiagnostic Innovation. Kasianowicz
Nanoscale Structures and Characterization. Krupenkin
Nanoscale Manipulation and Assembly. Chidsey, Morita, Crommie
Materials for Flexible Substrates, Displays, and Optoelectronics. Loy
Afternoon
Extreme High Vacuum and Vacuum Metrology. Stutzman
Cells at Surfaces. Tanaka
Surface Structure and Morphology. Robinson
Materials for Power Electronics. Lenahan, Hobart
Magnetic Thin Films and Multilayers. Arena
Fabrication and Characterization of MEMS and NEMS. Howe
Emerging Plasma Applications. Bourham
Etching for Advanced Interconnect II. Ohtake
Microfluidics, MEMS, and Lab-on-a-Chip. Klapperich, Lee
Nanoscale Devices and Detection. Ralph
Process Integration and Modeling for Nanoscale Semiconductor Devices. Giles, Briere
IPF: Frontiers in Physics. Roukes, Leemans, Soljacic, Blandford
Surface Functionalization for Selective Area ALD. Bent, Delabie, Kessels
Wednesday, 15 November
Morning
Electron, Photon, and Ion-Beam Induced Desorption and Their Effects on the Dynamics of Accelerators. Molvik
Materials Coatings for Reduction of Outgassing. Setina
Ultra-Bright Light Sources. Umbach, Jacobsen, Larabell, Kirz, Wurth
Reactions on Metal and Bimetallic Surfaces. Pierce, Barteau, Frenken
New Directions in Compound Semiconductors. Wanke, Zhang, Jones
Electronic and Vibrational Excitations and Dynamics. Johnson, Uvdal
Molecular Ion Sources and Characterization of Biomaterials. Mahoney, Braun
Magnetic Imaging. Hellwig, Wulfhekel, Crooker, Plummer
Glancing Angle Deposition I. Lu
Plasma Deposition. Ho
Biointerfacial Modification and Bioimmobilization. Vöros, Healy
Nanotribology and Nanomechanics. Carpick
International Developments in Nanoimprint Lithography. Schift, Chou, Hiroshima, Soles, Lee
Thin Films for Photovoltaics and Energy Applications. Venkatasubramanian
Afternoon
Space-Based Vacuum Applications and Instrumentation. Wüest, Hecht
Ultra-Bright Light Sources. Eberhardt, Williams, Havenith, Heinzmann
Growth Processes on Metal and Semiconductor Surfaces. Jia, Hannon
Magnetic Semiconductors. Gamelin, Idzerda
Organic Film Growth and Characterization. Engstrom, Bernasek
Imaging and Characterization of Biological Materials. Heeren, Cooks
Exchange Bias and TMR. Schuller, Mathon, Hayakawa
Glancing Angle Deposition II. Robbie
Plasma-Wall Interactions and Plasma Sources. Ullal, Hoffman
Atmospheric and Microplasmas. Muñoz-Serrano
Nanolithography and Patterning. Willson
Nanotube Devices and Processes. Hersam, Roth
Thin Films for Energy Applications in Photovoltaics, Fuel Cells, Hydrogen Storage, and Batteries. Notten
Thursday, 16 November
Morning
Special History Session: Franklin and the Future. Chaplin, Richmond, Schein, McGrath, Dylla
Organic Electronic Materials and Devices. Marks
Reactivity of Oxide Surfaces I. Dohnalek
High-k Dielectric Characterization. Garfunkel
Self-assembled Monolayers. Barrena
Ultra-thin Films and Buried Interfaces. Giannuzzi
Spin Injection. Petukhov, Luepke
Pulsed Plasmas in Surface Engineering. Anders
Hard and Nanocomposite Coatings: Synthesis, Structure, and Properties. Suresh
Plasmas in Bioscience. Oehr
Plasmas and Polymers. D’Agostino
Plasmonic Methods and Submicron Structures for Biology and Medicine. Chilkoti, Maeda
Biological and Molecular Applications of Nanoscale Structures. Timp, Austin
Fundamentals in Thin-Film Deposition. Blank
Afternoon
Contacts to Organic and Molecular Devices. Hsu, Gundlach
Reactivity of Oxide Surfaces II. Fukui
Electronic Properties of High-k Dielectrics, Ferroelectrics, and Their Interfaces. Cho, Singh
Tribology Harrison
Combined Methods or Multiple Methods. Fulghum
Plasma Processing for High-k/III–Vs and Smart Materials. Pang
Plasma Modeling. Sawin
Biomolecule-Surface Characterization I. Griesser
Nanoscale Material Processing. Malliaras
Sensors, Metrology, and Control. Muller
Field Emission. Shaw
Pulsed Laser Deposition of Thin Films. Yalisov, Chrisey
Friday, 17 November
Morning
Molecular Electronics. Walker
Oxide Surfaces and Interfaces. Selloni
High-k Dielectric and Multifunctional Oxide Growth and Processing. Schaeffer, Doolittle
Coatings with Enhanced Thermal Stability and MAX Phases. Leyens, Jansson
Wear Mechanisms, Tribochemistry, and Nanotribology. Erdemir
Diagnostics. Chang
Biomolecular Surface Characterization II. Saavedra
Nanowires. Samuelson
In Situ/Ex Situ and Real-Time Monitoring and Characterization. Ludwig, Redwing
