AVS to Assemble in Anaheim
DOI: 10.1063/1.1825270
The 51st annual meeting of AVS, the Science and Technology Society, will take place in Anaheim, California, from Sunday, 14 November, through Friday, 19 November, at the city’s convention center.
A combination of invited and contributed presentations during the week-long meeting will highlight recent developments in experimental and theoretical research in both newly emerging and traditional fields of interest to the vacuum science community.
The meeting will feature technical sessions and topical conferences that are structured along the lines of the society’s 10 divisions and its 3 technical groups. The names of these divisions and groups reflect the range of topics that will be covered—advanced surface engineering, applied surface science, biomaterial interfaces, electronic materials and processing, magnetic interfaces and nanostructures, manufacturing science and technology, MEMS and NEMS, nanometer-scale science and technology, plasma science and technology, surface science, technology for sustainability, thin films, and vacuum technology.
The meeting’s plenary symposium lecturer is Don Eigler, IBM Fellow at the company’s Almaden Research Center in San Jose, California. He will deliver a talk entitled “Measurement of the Spin-Excitation Spectra of Single Atoms with the Scanning Tunneling Microscope” on Monday at 1:00pm in Ballroom A at the convention center.
On Wednesday, meeting attendees will gather at the awards assembly and reception at 6:15pm in Salon F at the Anaheim Marriott Hotel. The following individuals will be recognized for their achievements in the discipline.
Rudolf M. Tromp, manager of molecular assemblies and devices at IBM’s T. J. Watson Research Center, in Yorktown Heights, New York, will receive the Medard W. Welch Award for 2004. He is being honored for his “fundamental discoveries in epitaxial growth and elucidation of their applications to technological problems.”
The Albert Nerken Award will be presented to Johan K. Fremerey for his “development of a practical spinning rotor gauge and contributions to the understanding of gaseous drag.” Fremerey recently retired as head of the magnetic bearing laboratory in the central department of technology, a division of Research Center Jülich, in Jülich, Germany.
Kunio Takayanagi, a professor of physics at the Tokyo Institute of Technology, will receive the Gaede–Langmuir Award. He is being recognized for his “seminal elucidations of the structure of surfaces and nanostructures.”
The Peter Mark Memorial Award will go to Kathryn W. Guarini, research staff member at IBM’s T. J. Watson Research Center. She is being honored for the “development of novel devices and innovative techniques for nanopatterning using proximal probes and chemical self-assembly.”
Jacqueline G. Kane, science teacher at St. Ursula Academy in Toledo, Ohio, will be honored with the John L. Vossen Memorial Award. She was chosen for her work in “developing a classroom demonstration experiment in quantification of soil contaminant extraction.”
Richard E. Muller will receive the George T. Hanyo Award for his “innovative development of electron beam lithography techniques, enabling space flight and new areas of research.” Muller is a member of the technical staff at the Jet Propulsion Laboratory in Pasadena, California.
The technology and equipment exhibition takes place in Exhibit Hall B on Monday from 1:00pm to 8:00pm, Tuesday from 11:00am to 6:00pm, and Wednesday, from 10:00am to 4:00pm.
Sessions with invited speakers
Sunday, 14 November
afternoon
Biomaterials plenary session. Mirkin, Grunze, Gaub
Monday, 15 November
morning
Cluster probe beams and general topics. Gillen
In-situ spectroscopy of biomolecules at interface. Stayton, Cremer
Thermal transport in thin films and nanostructured materials. Cahill, Shakouri, Ju, Majumdar
Processing and characterization for MEMS and NEMS. Kim
Carbon nanotubes—electrical properties. Avouris
Dilute magnetic and ferromagnetic semiconductors. Samarth, Keavney
Nanolayered and gradient coatings for surface engineering. Oden, Yerokhin
Electronic structure and excitations. Ho
Functionalization of semiconductor surfaces. Bent
ALD and applications. Schuhmacher, Park
afternoon
SIMS II: Biological and organic. Arlinghaus
Protein–surface interactions. Szleifer, Horbett
Material solutions for chip cooling. Burton, Seeger, Radack, Kenny, Glezer
High-k dielectrics: Electronic properties. Demkov
Micro- and nanofabrication techniques for MEMS and NEMS. Tai, Lee
Magnetic imaging and spectroscopy. Bode, Smith, Scholl
Plasma surface interactions in etching. Goeckner
Emerging plasma applications. Wertheimer, Yializis
Structure control of hard coatings in sputtering processes. Petrov
Simulation and theory of adsorption. Neurock
Assembled monolayers. Mirkin
Mechanical properties of thin films. Gerberich
Tuesday, 16 November
morning
Electron spectroscopies. Opila
The nano–bio interface. Tirrell, Vogel, Spatz
High-k dielectrics: Growth and processing. Klein
Contacts and metallization. Porter, Cabral Jr
Spintronics. Oestreich, Chung, Ji
MEMS and NEMS: Enabling tools for scientific research. Madou
Nanotube processing and composite materials. Brinson
Hard and low friction coatings with advanced designs. Shtansky, Singer, Veprek
Catalytic reactions: The role of surface steps and structure. Somorjai
Self-assembled monolayers. Porter
Thin films on flexible and polymer substrates. Graff
afternoon
Biomembranes on a chip. Vogel, Groves
Defects and interfaces in electronic materials and devices. Galeckas
Biomagnetism. Sun, Paulson, Rife, Wen
Nano/MEMS manufacturing and plasmas. Najafi
45-nm node with panel discussion. Tatsumi, Wise
Plasma and polymers. Creatore
Semiconductor heteroepitaxy and nanostructures. Fitzgerald
Hydrocarbon reactions on metal surfaces. Campbell
Welch Award symposium: Nucleation and growth. Kellogg, Tromp, Schreiber
Focused beam processing and fabrication. Russell
Fleming centenary session: The birth and evolution of electronics. Dylla, Redhead, Ferrario, McGuire
Wednesday, 17 November
morning
Chemometric analysis of spectral or image data: XPS/TOF-SIMS applications. Shaver
Cell–surface interactions. Wong, Elliott, Yamato
Magnetic nanostructures. Xue, Cebollada, Li
Semiconductor manufacturing technologies for the 45-nm crisis. Sadaka, Lenoble, Stephan, Cleavelin, Bourianoff
Nanoscale patterning and lithography. Hong, Zhitenev
Molecular and organic films and devices: Electronics. Horowitz, Malliaras
Plasma in nanoscale applications. Ichiki, Zhang
Plasma sources. Awakowicz
Metal oxides and clusters I: Formation and structure. Metiu
Semiconductor surface and interface structure. Lagally
Optical thin films. Martinu
Contamination control, outgassing, and modeling. LaMarche, Stowers, Shin
Science of semiconductor white light I. Krames, Dupuis, Bradley, George, Schubert
afternoon
Biological applications of surface analysis. Davies
Passive and nonfouling surfaces. Messersmith, Nagasaki
Exchange coupling, surfaces, and interfaces. Pescia, Nogués, Skumryev
Nondestructive analysis and metrology for advanced manufacturing. Brundle, Current
Nanotribology and nanomechanics. Mugele
Narrow-gap semiconductors. Tiedje, Deelman
Contacts to molecules and molecular films. Zhu, Knupfer
Metal oxides and clusters II: TiO2 and photocatalysis. Yates Jr
Surface collision dynamics. Beck, Yamada
Vacuum measurement, sensors, and control. Ladd
Science of semiconductor white light II. Crawford, Holloway, Adesida, Nemanich, Creighton
Thursday, 18 November
morning
High-k dielectrics. Wallace, Moon
Surface modification of biomaterials. Ruehe, Kenan, Marchant
Magnetic oxides and half-metallics. Dowben, Shen
Advanced process control. Sonderman
Nanoscale fabrication. Matsui
Nanowires I. Lee
Molecular electronics. Janes
Atmospheric and microdischarges. Lee
Wide-bandgap semiconductors. Hoffbauer, Gerbi
Metal oxide and clusters III: Supported cluster formation and reactivity. Anderson
Tribology, adhesion, and friction. Landman
Halogen and oxygen surface reactions and etching. Kummel
Modeling and fundamentals in thin-film deposition. Amar
Sustainable manufacturing, nanotechnology, and environmental policy. Skerlos, Palumbo, Hutchison, Davis
afternoon
Fuel cell, catalytic, and nanomaterials characterization. Zuo, Wagner
Biosensors and biodiagnostics. Lopez, McMurchie
Multifunctional materials. Spaldin
Oxides on semiconductors. Walker
Molecular spintronics and dynamics. Dalal, Sessoli, Pasupathy, Vollmer, Lindner
Nanoscale imaging. Bennewitz
Nanowires II. Takayangi, Mayer
Molecular and organic films and devices: Optoelectronic. Friend
Plasma–surface interaction. Yamasaki
Compound semiconductor growth and surface structure. Hicks, Feenstra
Metal oxides and clusters IV: Oxide surface chemistry. Grassian
Photovoltaic thin films. Dhere, Ramanathan
Fuel cells for clean power, hydrogen storage. Singhal, Jones
Friday, 19 November
morning
FIB and novel ion-analysis methods. Young, Bohne
Bio-MEMS and microfluidics. Folch
Advanced magnetic data storage and thin film processing. Slaughter, Katine
Nanometer-scale structures. Guarini
Plasmas in bioscience. Satriano, Favia
Hydrated surface phenomena. Wolf
Bimetallic surface chemistry and structure. Chen
In-situ/ex-situ and real-time monitoring. Collins, te Velthuis
Tromp
Fremerey
Takayanagi
Guarini
Kane
Muller
