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Article

Nanofabrication

FEB 01, 1990
Building complex semiconductor structures with features as small as 100 atoms across brings quantum effects to life but challenges fabrication technology.
Henry I. Smith
Harold G. Craighead

A decade ago the fabrication and study of electron devices whose smallest features were just under 1 micron in size represented the forefront of the field. Today that forefront has moved down an order of magnitude to 100 nanometers, engendering new terminology based on the prefix nano, from the Greek word for dwarf: “nanoscale devices,” “nanolithography,” “nanofabrication.”

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References

  1. 1. A. N. Broers, IBM J. Res. Dev. 32, 502 (1988). https://doi.org/IBMJAE
    M. Isaacson, A. Murray, J. Vac. Sci. Technol. 19, 1117 (1981).https://doi.org/JVSTAL

  2. 2. G. A. Sai‐Halasz, M. R. Wordeman, D. P. Kern, S. Rishton, E. Ganin, IEEE Electron Dev. Lett. 9, 464, 633 (1988). https://doi.org/EDLEDZ
    G. Shahidi, D. A. Antoniadis, H. I. Smith, IEEE Electron Dev. Lett. 9, 94 (1988).https://doi.org/EDLEDZ

  3. 3. U. K. Mishra, A. S. Brown, M. J. Delaney, P. T. Greiling, C. F. Krumm, IEEE Trans. Microwave Theory Tech. 37, 1279 (1989).https://doi.org/IETMAB

  4. 4. K. Ismail, D. A. Antoniadis, H. I. Smith, Appl. Phys. Lett. 55, 589 (1989).https://doi.org/APPLAB

  5. 5. T. A. Fulton, G. J. Dolan, Phys. Rev. Lett. 59, 109 (1987).https://doi.org/PRLTAO

  6. 6. K. Ralls, R. A. Buhrman, Phys. Rev. Lett. 60, 2434 (1988).https://doi.org/PRLTAO

  7. 7. W. Chu, A. Yen, K. Ismail, M. I. Shepard, H. J. Lezec, C. R. Musil, J. Melngailis, Y. C. Ku, J. M. Carter, H. I. Smith, J. Vac. Sci. Technol. B 7, 1583 (1989).https://doi.org/JVTBD9

  8. 8. R. L. Kubena, F. P. Stratton, J. W. Ward, G. M. Atkinson, R. J. Joyce, J. Vac. Sci. Technol. B 7, 1798 (1989).https://doi.org/JVTBD9

  9. 9. M. A. Gesley, F. J. Hohn, R. G. Viswanathan, A. D. Wilson, J. Vac. Sci. Technol. B 6, 2014 (1988).https://doi.org/JVTBD9

  10. 10. T. H. P. Chang, D. P. Kern, M. A. McCord, J. Vac. Sci. Technol. B 7, 1855 (1989).https://doi.org/JVTBD9

  11. 11. J. Itoh, T. Kanayama, N. Atoda, K. Hoh, J. Vac. Sci. Technol. B 6, 409 (1988). https://doi.org/JVTBD9
    A. Moel, M. L. Schattenburg, J. M. Carter, H. I. Smith, J. Vac. Sci. Technol. B 7, 1692 (1989).https://doi.org/JVTBD9

  12. 12. K. Ismail, W. Chu, A. Yen, D. A. Antoniadis, H. I. Smith, Appl. Phys. Lett. 54, 460 (1989).https://doi.org/APPLAB

  13. 13. C. T. Liu, K. Nakamura, D. C. Tsui, K. Ismail, D. A. Antoniadis, H. I. Smith, Appl. Phys. Lett. 55, 168 (1989).https://doi.org/APPLAB

  14. 14. K. Ismail, T. P. Smith, W. T. Masselink, H. I. Smith, Appl. Phys. Lett. 55, 2766 (1989).https://doi.org/APPLAB

  15. 15. J. P. Kotthaus, Phys. Scr. T19, 120 (1987).https://doi.org/PHSTBO

  16. 16. A. Yen, R. Ghanbari, H. I. Smith, Microelectron. Eng. (1989), to be published.

  17. 17. M. A. Reed, J. N. Randall, R. J. Aggarwall, R. J. Matyi, T. M. Moore, A. E. Wetsel, Phys. Rev. Lett. 60, 535 (1988).https://doi.org/PRLTAO

  18. 18. J. N. Randall, M. A. Reed, G. A. Frazier, J. Vac. Sci. Technol. B 7, 1398 (1989). https://doi.org/JVTBD9
    N. Margolus, T. Toffoli, G. Vichniac, Phys. Rev. Lett. 56, 1694 (1986).https://doi.org/PRLTAO

  19. 19. B. J. van Wees, H. van Houten, C. W. J. Beenakker, J. G. Williamson, L. P. Kouwenhoven, D. van der Marcel, C. T. Foxon, Phys. Rev. Lett. 60, 848 (1988). https://doi.org/PRLTAO
    D. A. Wharam, T. J. Thornton, R. Newbury, M. Pepper, H. Ahmed, J. E. F. Frost, D. G. Hasko, D. C. Peacock, D. A. Richie, G. A. C. Jones, J. Phys. C 21, L209 (1988).https://doi.org/JPSOAW

  20. 20. G. Timp, H. U. Baranger, P. de Vegvar, J. E. Cunningham, R. E. Howard, P. Behringer, P. M. Mankiewich, Phys. Rev. Lett. 60, 2081 (1988).https://doi.org/PRLTAO

  21. 21. K. Ismail, D. A. Antoniadis, H. I. Smith, Appl. Phys. Lett. 54, 1130 (1989).https://doi.org/APPLAB

  22. 22. H. Sakaki, Jpn. J. Appl. Phys. 19, L735 (1980).https://doi.org/JJAPA5

More about the authors

Henry I. Smith, Massachusetts Institute of Technology, Cambridge.

Harold G. Craighead, Cornell University, Ithaca, New York.

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This Content Appeared In
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Volume 43, Number 2

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