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Christoph Heiden

OCT 01, 2000

DOI: 10.1063/1.1325212

Alex Braginski
John Clarke
Michael Mück

This article is only available in PDF format

More about the Authors

Alex Braginski. Institute for Thin Film and Ion Technology, Jülich, Germany.

John Clarke. University of California, Berkeley.

Michael Mück. University of Giessen, Giessen, Germany.

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This Content Appeared In
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Volume 53, Number 10

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