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Plasma Science, Thin Films, and Nanotech Dominate AVS Symposium

OCT 01, 2005

DOI: 10.1063/1.2138424

Karen H. Kaplan

Do you care about the future of solar power development? Are you curious about the potential applications of structural DNA nanotechnology? Want to know more about gas flow and pump technology?

These topics and scores of others of interest to the vacuum science community are part of the agenda for the 52nd International Symposium of AVS, the Science and Technology Society. This year the five-day annual meeting, which includes an awards ceremony, is slated for Sunday, 30 October, through Friday, 4 November, at the Hynes Convention Center in Boston.

“The Crossbar Architecture for Nanoelectronics” is the topic of this year’s plenary symposium lecture by R. Stanley Williams, an H-P senior fellow at Hewlett-Packard Laboratories in Palo Alto, California. Williams’s talk, at noon Monday in Ballroom A of the convention center, will focus on the “crossbar latch,” a promising nanometer-scale alternative to the transistor. The symposium schedule also includes dozens of lectures, conferences, presentations, and discussions each day. Another highlight is the ASTM Plenary Lecture, which takes place at 2:00pm Sunday in the Hampton Room at the Sheraton Boston Hotel. Susan J. Kerber of Material Interfaces Inc will discuss the application of standards for surface analysis by photon, electron, and ion emission or reflection in manufacturing.

On Wednesday, symposium attendees will gather at 6:15pm in Ballroom A of the convention center for the awards ceremony and reception. Four scientists are being recognized for their accomplishments in the field.

Charles S. Fadley, advanced light source professor for the physics department at the University of California, Davis, and the materials sciences division of Lawrence Berkeley National Laboratory, will receive the Medard W. Welch Award for 2005. He is being honored “for the development of novel techniques based on photoelectron spectroscopy and synchrotron radiation, and their application to the study of the atomic, electronic, and magnetic structure of surfaces and buried interfaces.”

Stan Veprek, retired professor, chair, and director of the Institute for Chemistry of Inorganic Materials at the Technical University Munich in Germany and a visiting principal scientist at the Singapore Institute of Manufacturing Technology, will receive the 2005 John A. Thornton Memorial Award and Lecture. He is being recognized “for the generic design concept of strong and hard materials as well as their deposition as thin films by plasma assisted techniques.”

Jane P. Chang, associate professor in the chemical and biomolecular engineering department at the University of California, Los Angeles, is receiving the Peter Mark Memorial Award “for pioneering work in the synthesis, processing and characterization of novel materials for applications in microelectronics and opto-electronics.”

C. R. Brundle of C. R. Brundle & Associates of Soquel, California, a consultant and instructor in surface and thin film analytical methods, will receive the Albert Nerken Award “for pioneering early development in the field of electron spectroscopy, and sustained applications to surface science and a wide range of industrial materials characterization issues.”

Poster sessions are 5:00pm Monday and 4:00pm Tuesday in Exhibit Halls C and D; technology exhibits are noon to 7:00pm Monday, 10:00am to 6:00pm Tuesday, and 10:00am to 4:00pm Wednesday, also in Exhibit Halls C and D.

Students who plan to attend will be interested in the job information forum at noon Tuesday in the Sheraton Hotel’s Independence Ballroom. Four speakers from academia, national laboratories, industry, and nontraditional science careers will discuss how they acquired their jobs and how they have developed their careers. The forum is open to all symposium students and postdoc attendees. A student mixer is planned for 7:00pm Monday at popular nightspot Kings’ Deville Lounge at 10 Scotia Street in Boston.

For attendees who are bringing spouses or friends, a companion lounge will open at 7:00am daily Monday through Thursday at the Sheraton’s Turning Point Lounge, and daily tours of various sites around the Boston area will be offered. For more information and to register, visit http://www2.avs.org/symposium/boston/registration.html .

Sessions with Invited Speakers

Sunday, 30 October

Afternoon

Renewable and Alternate Energy. Lewis, Barnett, Schmidt, Zawodzinski

Biomaterials Interfaces Plenary Session. Ratner, Engel, Xie

Monday, 31 October

Morning

Nanocomposites and Coatings with Enhanced Thermal Stability. Veprek, Voevodin, Bobzin

Catalytic Chemistry of Hydrocarbons. Kawai

Oxide Surface Structure and Characterization. Pacchioni

Nanoscale Analysis: Biomaterial and Other Applications. Dunn, Hartschuh, Diebold

Processing and Characterization of Materials for MEMS & NEMS. Auciello

Nanowires. Lieber

Plasma Diagnostics. Hershkowitz

Thin Films for Photovoltaic and Energy Applications. Richter

Electronic Properties of High-k Dielectrics and Their Interfaces. Robertson

Novel Approaches in Wide-Bandgap Semiconductors. Skowronski, Allerman

DNA Structures and Surfaces. Seeman, Levicky, Heller

BioMaterials and Neutrons (BioMaN) I. Steitz, Blasie, Kuhl

Afternoon

MAX Phases: Nanolaminates and Nanomechanical Measurements. Barsoum, Hultman, Sproul

Catalysis for the Hydrogen Economy. Chorkendorff

Nanotribology. Salmeron

Electron Spectroscopies. Pireaux

Materials and Processes for BioMEMS and Bio-NEMS. Payne

Nanometer Scale Assembly. Nuzzo, Jacobs

Dielectric Etch I. Hudson

Silicon Etching. Paterson

Focused Beam Processing and Fabrication. Liang, Melngailis

High-k Dielectric Growth and Processing. Chang, Wilk

Science of Semiconductor White Lighting. Wetzel, Achermann, Fischer

DNA Detection and Sensing. Corn

Biomaterials and Neutrons (BioMaN) II. Chen, Byron, White, Rheinstädter, Anderson

Tuesday, 1 November

Morning

Total and Partial Pressure Gauging. Tilford

Hard Coatings and Wear Mechanisms of Protective Coatings. Berg, Sawyer

Vibrational Spectroscopy of Surfaces. Trenary

Defects on Oxide Surfaces. Besenbacher, Diebold

Magnetic Nanostructures, Surfaces, and Interfaces. Shi, Qiu, Haskel, de Jongh

Surface Characterization of Organic and Biological Systems. Dyer, Sjovall

Micro and Nano Fabrication Techniques for MEMS and NEMS. Busnaina, Schwab

Nanoscale Electronic Devices and Detection. Jiang, Kouwenhoven, Mamin

Plasmas in Bioscience. Fisher, Rossi, Lopez

Plasma Surface Interactions I. Winters

Atomic Layer Deposition—Oxides. Hwang

Defects, Interfaces, and Surface Passivation in Electronic Materials. Strzhemechny, Zahn

DNA Surface Characterization. Gamble, Petrovykh, Georgiadis

High-k Dielectric Characterization. Gustafsson, Bennett

Afternoon

Compound Semiconductors. Erwin

Tribology, Adhesion, and Friction. Perry

Magnetization Dynamics. Beschoten, Zhang, Hillebrands

Ultrafast Surface Dynamics. Heinz, El-Sayed

Advanced Manufacturing Processes for Silicon Devices. Grynkewich

Atomic Layer Deposition—Metals. Gordon

Growth and Characterization of ZnO. Osinsky

Spin Injection. Parkin, Hall

Sensors/Diagnostics. Whitten

Bottom-Line Benefits from Sustainable Business Practices. Gips, Paydos

Wednesday, 2 November

Morning

Growth and Alloying of Surfaces. Brune, McGrath

Gas Flow and Pump Technology. Hinkle

Self-Assembled Monolayers. Allara

Reactions on Metals and Oxides. Kiskinova

Magnetic Imaging and Spectroscopies. L’abbe, Pietzsch, Fadley

Essential Tools for Surface Analysis. Gaarenstroom, Graham

Magnetic Imaging and Spectroscopies. Murday, Rueckes, Quake, Von Ehr

Nanometer Scale Imaging. Reichfing, Grutter

Plasma Enhanced CVD and ALD. Kinoshiter, Leeser

Advanced Gate-Stack Fabrication. Chan

Mechanical and Tribological Properties of Thin Films. Spaepen

Contacts to Organic and Molecular Devices. Baldo

In-Situ/Ex-Situ and Real-Time Monitoring. Chabal, Levi, Hoffmann

Protein-Surface Interactions. Hook

Biomembranes and Spectroscopy. Zhang, Wiseman

Afternoon

Surface Structure and Morphology Modification. Madey

Hydrogen, Outgassing, and Vacuum Systems. Outlaw, Hjörvarsson

Organic Film Growth and Characterization. Richardson

Reactions on Nanoclusters. Freund

Magnetic Semiconductors. Furdyna, Jonker

SIMS Cluster Probe Beams and General Topics. Magee, Garrison

Metrology and Process Control for Advanced Manufacturing. Norasetthekul

Nanopatterning and Manipulation. Stroscio

Atmospheric Plasmas and Microdischarges. Korzec, Tachibana

Fundamentals of Thin Films. Abelson

Contacts to Semiconductors. Schultz

Thursday, 3 November

Morning

Water-Surface Interactions. Wandelt

Functionalization of Semiconductor Surfaces. Boland

Reactivity of Bimetallic Surfaces. Koel

Advanced Magnetic Storage and Manufacturing Processes. Ando, Cyrille, Gaidis

Thin Film Characterization. Feldman

Nanotube—Based Devices, Ishibashi, Appenzeller

Process Equipment Modeling. Nanbu

Optical Thin Films. Hodgkinson, Hendrix, Chipman

Heteroepitaxy and Low-Dimensional Structures. Goorsky, Petroff

BioMEMS and Microfluidics. Palmore

Sugars at Surfaces. Seeberger

Afternoon

Transport and Structural Stabilization of Surfaces. Miranda

Gas-Surface Reaction Dynamics. Morris

Magnetic Oxides. Leighton

Nano Processing. Eriksson

Emerging Plasma Applications. Monaghan, Giapis

Plasma Sources and Equipment. Yeom

Transparent Conducting Oxides. Fan, Moodera

Organic and Molecular Optoelectronics. Bulovic, Thompson, Tessler

Dilute Nitrides and Small-Bandgap Semiconductors. Walukiewicz, Wanlass

Bionanotechnology. Jeon

Friday, 4 November

Morning

Surface Modification Through Etching. Kolasinski

Electronic Structure of Surfaces. Rotenberg

Biosensors and Biomagnetism. Whitman, Hoffmann

Practical Methods and Applications for Surface Analysis. Fletcher

Nanotube Processing and Properties. Hata

Thin Films on Flexible and Polymer Substrates. Wagner, Lewis

Organic Electronic Devices. Roichman, Jackson

PTO.v58.i10.66_1.f1.jpg

A flexible plastic substrate containing nanowire devices, which don’t degrade when bent.

MCALPINE, FRIEDMAN & LIEBER, HARVARD U.

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Fadley

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Veprek

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Chang

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Brundle

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This Content Appeared In
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Volume 58, Number 10

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