Boston hosts 2008 AVS symposium
DOI: 10.1063/1.2982124
AVS: Science and Technology of Materials, Interfaces, and Processing will present its 55th International Symposium and Exhibition Sunday–Friday, 19–24 October, at the John B. Hynes Veterans Memorial Convention Center in Boston. Titled “From Nano to Astronomical,” it features technical symposia, topical conferences, short courses, exhibitor workshops, and a technical exhibition. Some 3000 scientists, engineers, academics, and students from the US and abroad are expected to attend.
Technical program
Technical symposia span many topics, including biomaterial interfaces, plasma science and technology, and vacuum technology. Program chair Bridget Rogers, associate professor of chemical and biomolecular engineering at Vanderbilt University, says a number of special events have been planned. “We have put together an amazing program this year,” says Rogers. “I am really excited.” Albert Fert of the Université Paris–Sud, winner of the 2007 Nobel Prize in Physics, will present a talk entitled “Spin Transport Between Spin-Polarized Sources and Drains: Advantage of Carbon Nanotubes on Semiconductors” on Wednesday afternoon. On Tuesday morning the frontiers of nanoscience will be explored during an invited session hosted by the nanometer-scale science and technology division. Talks will center on such topics as nanoelectronic circuits, nanolithography, and atomic force and scanning tunneling microscopy.
“We’re doing things a little differently this year,” says Rogers. “We’ve taken four topics that cross the boundaries of all the divisions, grouped them together, and called them focus topics.” The four focus topics center on biological, organic, and soft materials; energy; nanomanufacturing; and tribology. Representatives of all divisions put together the sessions, thereby providing a much broader view of each topic, according to Rogers. Four topical conferences—on bioMEMS, graphene, in situ microscopy and spectroscopy, and synchrotron-based spectroscopy and spectro-microscopy—also will be offered.
The 50th annual Industrial Physics Forum will be located with the AVS symposium. Titled “Frontiers in Imaging: From Cosmos to Nano,” it will be held 19–22 October and centers on the theme of digital imaging, with sessions on astronomical imaging, bio-imaging, materials imaging, and marine and terrestrial imaging. The IPF finishes off with its always popular session on frontiers in physics, which highlights the most exciting current research in all fields.
As is tradition, the biomaterial interfaces division will open the AVS meeting with its Sunday afternoon plenary session. “Bio-inspired Catalysis, Energy Production, and Transduction: Opportunities and Challenges” centers on bio-based energy production, with particular emphasis on the development of artificial photosynthetic devices and advances in the field of bio-fuel cells. On Monday afternoon, the division will also present an invited session honoring Bengt Kasemo of Sweden’s Chalmers University of Technology for his contributions to the field.
On Monday afternoon the plasma science and technology division honors the contributions to plasma science of retiring MIT professor Herbert Sawin. World-renowned industrial and academic leaders will speak on advances in plasma–surface interactions. The session is followed by a dinner reception at the Sheraton Hotel. On Tuesday afternoon Sawin will deliver the Plasma Prize Lecture entitled “Three-dimensional Modeling of Surface Profile Evolution During Plasma Etching.”
Special events
Various short courses will be offered from 20 October to 23 October on vacuum and equipment technology, materials processing, and materials and interface characterization. The annual science educators’ workshop for middle- and high-school science teachers, a combination of lecture and hands-on experience, will take place 20–21 October.
The annual exhibition of equipment, services, literature, and new technologies is scheduled for 21–23 October in the convention center. The exhibit attracts international attendees from a variety of industries. Last year’s successful Ask the Experts booth, hosted by the vacuum technology division, returns, so attendees can again bring their questions and problems.
Also in the exhibit hall Tuesday—Thursday will be the AVS Art Zone, entitled “Where Science and Technology Meet Art.” Symposium attendees can submit examples of their research that relate to the meeting’s science and technology, and the submissions will be judged for their aesthetic qualities. The top 50 images will be displayed, and all attendees can vote for their favorite.
As always, several social events have been planned. A welcome mixer is set for Monday, 5:30–7:00pm, in the convention center. On Wednesday morning, the 28th annual 5K run is scheduled at 6:15am. Wednesday evening, the AVS awards ceremony will be presented at the convention center. A list of award recipients is available on Physics Today’s website in the We Hear That section, http://blogs.physicstoday.org/wht/
With all the varied programming of the AVS symposium, “We encourage people to think beyond vacuum—the AVS is much more than that,” says Rogers. For more information, go to AVS’s website at http://www.avs.org
Sessions with invited speakers
Sunday, 19 October
Afternoon
Bio-inspired Catalysis, Energy Production, and Transduction: Opportunities and Challenges. Leadbetter, Moore, Heller
IPF: Astronomical Imaging. Bernstein, Fabricant, Ellerbroek, Monnier
Monday, 20 October
Morning
Integrative Materials and Processes for MEMS/NEMS. Piazza
Catalysis and Alloy Formation. Goodman
Atomic Layer Deposition of Hybrid Materials and ALD on 3D Nanostructures. Engstrom, Nielsch, Pellin
Plasma Etching for Advanced Interconnects. Chevolleau
Graphene and 2D Carbon Nanostructures. Wu, Chen
CMOS Extension and Metrology. Doris, Opila
IPF: Bio-Imaging. Cohen, Rugar, Kirchhausen, Hess, Olivier
Afternoon
Honorary Session for Bengt Kasemo. Besenbacher, Frank, Brisson, Kasemo
Hydrogen Storage. Mitlin, Sutter
Vacuum Cleanliness, Outgassing, Contamination, and Gas Dynamics. Herbert
Fabrication at the Micro- and Nanoscales for MEMS/NEMS. Ocola
Electron Spectroscopies. Watts, Fadley
Reactivity at Oxide Surfaces. Freund
Invited Highlights on Plasma–Surface Interactions—Honoring the Distinguished Career of Herbert H. Sawin. Gottscho
Materials Issues in Graphene from SiC. Jernigan, First
IPF: Materials Imaging with Subatomic Resolution. Ho, Stockman, Batson, Giessibl, Luecken
Tuesday, 21 October
Morning
Protein and Cell Interactions at Interfaces. Leckband
Catalysis for Energy Sustainability. Marshall, Yudasaka, Norskov
Vacuum Pumping Technologies, Large Vacuum Systems, Vacuum Modeling. Conte, Jimenez
Materials Processing and Characterization for MEMS/NEMS. Manalis
Use of Cluster Ion Beams for Surface Analysis. Wücher
Dynamics at Surfaces. Auerbach
ZnO Materials and Devices. McConville, Jackson
Applications of Atomic Layer Deposition I. Summers
Advanced Gate Etching. Turkot
Graphene and Carbon Electronics. Bolotin, Geim
MEMS/NEMS for Biology and Medicine. Jensen, Paulaitis, Polla, Madou
Synchrotron-based Spectroscopy and Spectro-Microscopy. Nilsson, Heske, Zharnikov, Kiskinova
The Frontiers of Nanoscience. Williams, Allara, Bonnell, Bode, Morita
IPF: Marine/Terrestrial Imaging. Ackleson, Mazel, Widder, Wozencraft, Hubbard
Afternoon
Plasma-deposited Polymer and Organic Surfaces in Biological Applications. Alexander, Fridman, Wendt
Protein and Cells Interactions on Micro- and Nanofabricated Substrates. Lutolf
Photovoltaics. van de Sanden, Siebentritt
Photocatalytic Coatings. Watanabe, Herrmann
Vacuum Gauging and Calibration. Chung
Magnetic Microscopy and Magnetization Dynamics. Heinrich, von Bergmann, Mewes
Practical Surface Analysis. Fletcher
Reactions on Gold and Bimetallics. Hrbek
Dynamics and Novel Probes. Wodtke, Havenith
Complex and Multifunctional Oxides. Ahn
Applications of Atomic Layer Deposition II. Kim
Fundamentals of Plasma–Surface Interactions I. Sawin
Graphene: Characterization, Properties, and Application. Cho, Chhowalla
Microfluidics/Lab-on-a-Chip. Bashir, Grainger, Gerber, Roy
Synchrotron-based Spectroscopy and Spectro-Microscopy. Wurth, Hitchcock, Perucchi, Lamb
IPF: Frontiers in Physics. Gordon, Flanz, Ye, Quigg
Wednesday, 22 October
Morning
Organized and Structured Organic Interfaces. Zhang, Bussetti, Laskin
Quantitative Nanoscale Sensing and Single-Molecule Techniques. Klenerman, Armani
Electrochemical Storage. Dillon, Hammond, Nazar
Atmospheric Pressure Treatments and Hard and Nanocomposite Coatings. O’Neill, Weltmann, Janssen
Surfaces and Interfaces in MEMS/NEMS. Brenner
Magnetic Thin Films, Nanoparticles, and Nanostructures. Majetich
Advanced Data Analysis for Surface Characterization. Artyushkova
Surface Structure and Morphology. Thiel
High-k Oxides and High Mobility Substrates. Vogel
Chemical Vapor Deposition. Ramanathan
Plasma Sources. Holber
Beyond CMOS. Lee, Awo-Affouda, MacDonald, Fuhrer
In Situ Spectroscopy—Interfacial Science and Catalysis. Salmeron, Tyliszczak, Ade
Characterization and Imaging of Nanostructures. Kalinin
Afternoon
Advances in Surface Analytical Methods for Organic and Biological Interfaces. Nygren
Quantitative Analysis of Biointerfaces. Grunze, Roke
Energy: Tools and Approaches. Sampath
Hard and Nanocomposite Coatings: Synthesis, Structure, and Properties II. Riviere
Nanotribology and Nanomechanics. Haugstad
New Directions in Spintronics. Moodera, Ross, Pratt, Fert
Frontiers of Analysis and Combined Materials. Gilmore
Structure of Oxide Surfaces and Oxide Heterostructures. Risse
Electrons and Electronic Spectra at Surfaces. Osterwalder
Molecular and Organic Electronics. Tao
Computational and Experimental Studies of Thin Films. Fichthorn
Fundamentals of Plasma-Surface Interactions II. Graves
Nanomanufacturing I: Plasma Processing and Materials. Kortshagen, Humfeld
In Situ Microscopy and Spectroscopy—Interfacial Science and Catalysis. Bañares, Datye, Saka
Nanoscale Devices and Sensors. Lim
Thursday, 23 October
Morning
Semiconducting Biointerfaces and Sensors. Lu
Engineering Biointerfaces. Parikh, Steinem
Energy: Tools and Approaches. Lin
Glancing Angle Deposition (GLAD) I. Lakhtakia
Advances in Surface Engineering for Friction and Wear Control. Cavaleiro, Lince
Magnetic Surfaces, Interfaces, Thin Films, and Heterostructures. Caruso
Growth and Etching on Surfaces. Hines
Catalysis on Nanoclusters. Metiu
Contacts, Interfaces, and Defects in Semiconductors. Talin, Shur
Atmospheric Plasma Processing and Micro Plasmas. Tachibana
Plasma Modeling. Bogaerts
Printable Lithography and Processing. Rogers, Kumar
In Situ Spectroscopy—Dynamic Nanoscale Processes. Sharma, Stach, Yang
Nanoscale Assembly Nealey
Afternoon
Biological and Molecular Applications of Nanostructures. Spatz
Plasmonics and Magnetoplasmonics Aimed at Biosensing. Zhang, Clavero, Lazarides
Glancing Angle Deposition (GLAD) II. Zhao
Water-Surface Interactions. Kay
Novel Reactive Surfaces. Gellman
Thin Films for Displays and Flexible Electronics. Ma
Plasma Diagnostics, Sensors, and Control II. O’Connell
Plasma Deposition and Plasma-Enhanced Atomic Layer Deposition and Etching. Hodson
Nanomanufacturing II: Nanostructures. Ferreira, Bawendi, Samuelson
In Situ Microscopy—Dynamic Nanoscale Processes. Zaluzec, Huang, Ross, Zhang
Nanolithography and Manipulation. Ruiz, Hla
Friday, 24 October
Morning
Pulsed Plasmas in Surface Engineering. Gudmundsson, Emmerlich
Environmental Surfaces and Water Interaction with Oxide Surfaces. Rosso
Semiconductor Surfaces. Soukiassian
Plasma Processing for 3D Integration, Photonics, Optoelectronics, and Memory Devices. Chebi
Nanoscale Processes. Pfefferle

GREATER BOSTON CVB
